Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials

Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials
Springer; 1st Edition | April 15, 2010 | ISBN-10: 1848828934 | 327 pages | PDF | 17.68 MB

The rapid advancement in chemical vapour deposition (CVD) technology has reached many fields of application, including thin film coating, microelectronics and communications. Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures.
While previous discourses on CVD have had a tendency to focus solely on electronics, this book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. It addresses a wide range of topics related to CVD theories and applications. From physical fundamentals and principles, to optimisation of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials.


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